Bottega Veneta Launches Second Annual New Exposure Photography Competition

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New Exposure High Res


Bottega Veneta has announced the second annual New Exposure photography competition. The contest provides an opportunity for undiscovered talents to gain access to the key decision-makers in the areas of fashion, photography, art and design. This is the first year the contest is open to international applicants.


The jury for NEW EXPOSURE is composed of eminent personalities from the world of fashion, photography,
art and design including Tomas Maier, Creative Director of Bottega Veneta; Ivan Shaw, Photography Director at TVogue; supermodel
Linda Evangelista; world-renowned fashion editor & stylist Carlyne Cerf de Dudzeele; acclaimed photographers Collier
Schorr and Craig McDean; influential make-up artist Pat McGrath; Andrew Bolton, Curator, Costume Institute at the
Metropolitan Museum of Art; visionary Creative Director Doug Lloyd; leading hair stylist Guido Palau; gallerist Yossi Milo;
and Jimmy Moffat, Founding Partner of Art+Commerce.

The panel will review the submitted portfolios in late July and choose ten finalists who will then be assigned a final project
that will be reviewed at the end of the summer. The winner will be announced during a private ceremony in September during New York Fashion Week.  In addition to being honored at the ceremony, the winner will receive a prize package including $10,000, a one-year mentorship with Art+Commerce, as well as a mentorship with Ivan Shaw at Vogue, and also the opportunity to shoot an exclusive project for Bottega Veneta which will be announced later this year.

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